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AISB event Bulletin Item

CfP: "Ontology and Semantic web for Manufacturing", 29-30 May 2011, Greece
Contact: Lutz Schrder,

OSEMA 2011 Call for Papers 1st International Workshop on Ontology and Semantic web for Manufacturing (OSEMA 2011) at the 8th Extended Semantic Web Conference (ESWC 2011) Hersonissos, Crete

The necessity of continuous innovation and improvement in productivity presents the manufacturing industry with huge challenges. Not only is there a demand for more creative designs, there is also the need to improve support for streaming designs into production lines. Delivering products to the market involves the flow of information between several steps ranging from design to prototyping, manufacturing and distributing.  Interoperability across software supporting these activities is notoriously limited.

A semantic layer in the manufacturing sector may facilitate scenarios such as the development of new products considering restrictions and limitations of the manufacturing facility on the one hand and on the other hand considering customer needs. Here, the design of  new the product is instantiated into a product ontology. This ontology has metadata including features related to materials, colors, dimensions, etc. Such features reflect customer preferences, but imply the necessity of processes to acquire and manage them. In a second step into this scenario, the ontology of the manufacturing process can be instantiated by extracting features from the product ontology, thus enabling e.g. the automatic inference of manufacturability of the product.

In this vein, ontologies and the Semantic Web facilitate the creation of such metadata and enable reasoning over product and process restriction.
Although several approaches of this kind have been proposed, none of them are widely accepted so far, which means that there are still several issues requiring extensive discussion and consensus in the community. Therefore, it is necessary to provide a discussion scenario where theoretical positions, best practices, implementations, proposals of standards, and frameworks are presented. It will deserve special interest to discuss how the manufacturing industry can take advantage of Semantic Web technologies. OSEMA 2011 aims to provide such scenario.


- How can the Semantic Web support the development of new products?

- Why CAD ontologies? Do we really need them?

- Do we need one enterprise ontology, or a modular enterprise ontology?

- Can OWL be used to represent processes in the manufacturing domain?

- Knowledge management over the manufacturing ?Know how?.

- How can the versioning of products be managed? Can ontology help? How?

- How can raw materials be semantically described?

- Can there be an ontological framework for manufacturing so that designs and production are interoperable?

- Semantic search over the manufacturing information space

- How can tagging techniques be applied within the manufacturing domain?


We want to bring together researchers and practitioners active in the design, development, and application of ontologies and the Semantic Web in the manufacturing domain, as well as industrial representatives in Computer Aided Design (CAD), Computer Aided Process Planning (CAPP), and Computer Aided Manufacturing (CAM) industry who are interested in integrating the Product Life Cycle management into their software tools.


Submission deadline:     February 25, 2011
Acceptance notification: April 1, 2011
Camera-ready:            April 15, 2011
Workshop date:           May 29 or 30, 2011


Only electronic submissions will be considered. All submissions should be submitted in pdf format, to

Submissions should not exceed 14 pages and should be formatted according to the LNCS Springer format (
The workshop proceedings will both be uploaded to CEUR
( and placed on electronic media for distribution at the conference.


1. Aristeidis Matsokis, Laboratory for Computer Aided Design and Production, Switzerland.
2. Aziz Bouras, University Claude Bernard Lyon II, France.
3. David Baxter, University of Cranfield, England 4. Dong Yang, Shanghai jiao Tong University, China.
5. Grubic Tonci, University of Cranfield, England.
6. John Bateman, University of Bremen, Germany.
7. Jrgen Angele, Ontoprise, Germany.
8. Kristina Shea, Technische Universitt Mnchen, Germany.
9. Oliver Eck, Department of Computer Science, HTWG Konstanz, Germany.
10. Parisa Ghoudous, University Claude Bernard Lyon I, France.
11. Richard Gil Herrera, University Simn Bolivar. Venezuela.
12. Sylvere Krima, National Institute of Standards and Technology (NIST), USA.
13. Yuh-Jen Chen, National Kaohsiung First University of Science and Technology, Taiwan.


* Alexander Garca Castro, University of Bremen, Germany/University of Arkansas, USA. Email:

* Lutz Schrder, German Research Center for Artificial Intelligence (DFKI). Email:

* Carlos Toro, Vicomtech Research Centre / Donostia-San Sebastan, Spain. Email:

* Luis Enrique Ramos Garca, University of Bremen, Germany. Email: